會議現場-衛利CSTIC精彩展示

會議現場-衛利CSTIC精彩展示
發佈時間 Apr 07, 2025 瀏覽次數: 12

2025年3月25日積體電路科學技術大會(CSTIC) 2025在上海順利舉行。

關於會議

CSTIC 2025 will be held on March 24-25, 2025 in Shanghai, China, in conjunction with SEMICON China 2025. The conference will have ten symposiums covering all aspects of semiconductor technology with focus on manufacturing and advanced technology, including detailed manufacturing processes, device design, integration, materials, and equipment, as well as emerging semiconductor technologies, circuit design, and silicon material applications. Hot topics, such as artificial intelligence (AI) chips, 6G chips, neuromorphic computing technology, advanced memory technology, 3D integration, MEMS technology will also be addressed in the conference.


在會議期間,衞利國際科貿(上海)有限公司攜Monitoring & Testing of Nanoparticle Contaminants 報告進行精彩演示。

精彩現場 

衛利集團聚焦顆粒微污染管控和靜電防護,結合業界“光散射原理”、“凝結核原理”、“視覺/動態圖像偵測”等測試原理和方法積極參與到顆粒和Precursor測試的檢測中,為
Hygrid Analysis提供更有利的測試方法和儀器,帶來更加耳目一新的“眼睛”。
1. 濕化學品的Native Particle和Particle Precursor測試,可以對小到3nm的size測試,更還可對“硫酸”和“鹽酸”樣品完成9nm的顆粒測試;
2. 對於光阻液和PGME/PGMEA也可通過“視覺/動態圖像法”即時測試並提供“影像、顆粒粒徑和數量濃度”等資訊;
3. 對於清洗後或接觸濕法工藝後的產品表面會因殘留微小氣泡乾燥後造成各種顆粒不良,那對於液體中的氣泡可通過“視覺/動態圖像法”即時測試並提供“影像、氣泡數量以及污染物的分類”等資訊。